温度与气压对脉冲PECVD沉积氧化铝薄膜的影响

Influence of Temperature and Pressure on Permeation Resistance of AlO Coating on PET

在有机基体表面等离子体增强化学气相沉积(PECVD)Al2O3薄膜是提高其阻隔性能的有效方法,而高品质的Al2O3薄膜是提高阻隔性的关键因素之一。脉冲射频等离子体增强化学气相沉积(RF-PECVD)可以实现比热化学气相沉积技术更宽的气体工作压力、更多的单体选择和更好的薄膜性能,适合于制备高质量的薄膜。本文报道采用脉冲RF-PECVD氧化铝薄膜,且对影响薄膜结构和性能的工艺参数进行研究。通过椭圆偏振仪测量Al2O3的生长速率和折射率;利用红外光谱、扫描电镜和原子力显微镜对沉积的Al2O3薄膜进行成分、结构、表面粗糙度和形貌分析、测量和表征;采用透湿仪测量在有机聚酯薄膜表面沉积Al2O3层的阻隔性能。结果表明:薄膜沉积过程中的工作气压和沉积温度对脉冲RF-PECVD薄膜性能影响较大,在一定的沉积温度范围内,沉积的Al2O3薄膜为无色、透明、表面结构平滑致密;在温度相同的条件下,工作气压越高,纳米膜生长速率越快;而在相同工作气压下,沉积温度越低,薄膜生长速率越快。

The Al2O3 coatings were synthesized in the lab-built reactor by pulsed RF plasma enhanced chemical vapor deposition(RF-PECVD)on substrate of PET membrane,an advanced package material for organic electronic device.The influence of the pressure and deposition temperature on the permeation of oxygen and water-vapor was investigated with the advanced surface probes.The results show that the temperature and pressure had a major impact.To be specific,as the pressure increased at fixed temperature,the deposition-rate increased;as the temperature decreased,at fixed pressure,the deposition rate increased.Synthesized at the optimized temperature and pressure,the colorless,transparent,smooth,compact Al2O3 coatings(60 nm in thickness)on PET significantly increased the resistance against permeation of oxygen,water-vapor,and salt-fog.For example,its permeation of water vapor decreased by 1,000 times.