摘要
一次单晶硅生产工艺后,氩气会受到CO、H2等杂质气体的污染,无法再次使用,且杂质气体浓度通常小于0.01%,传统方法(如物理吸附、化学吸附和催化氧化)难以高效直接进行脱除。基于此背景,本文提出"化学链燃烧净化回收氩气"技术,采用第一性原理计算对高活性载氧体材料进行筛选,选择并制备了CuCoFe三元尖晶石载氧体材料,实现了中温条件下对低浓度杂质气体的精确脱除,处理后的氩气中CO及H_2含量低于0.001%,回收氩气纯度>99.9998%,单次循环回收率>90%。
Monocrystalline silicon photovoltaic cells industry is developing rapidly.Meanwhile,the argon gas which used for protected gas is highly demanded.After primary process production,argon gas is contaminated by impurity gases such as CO and H2,and cannot be reused.Usually,the impurity gas concentration is less than 0.01%.Traditional methods such as physical adsorption,chemical adsorption,and catalytic oxidation are difficult to directly and efficiently remove these trace amounts of impurity gas.Based on this background,this paper proposes a new technology of using chemical looping combustion technology to recycle the argon gas.To select a high activity oxygen carrier material,firstly,first principle calculation is employed to lots of spinel structures and found out a high-activity CuCoFe oxygen carrier material,which realizes the removal of trace amount of impurity gas under intermedium temperatures.After purification,CO,and H2 concentration was less than 0.001%,the recycle argon purity was more than 99.9999%,and the recycle rate was more than90%.
作者
李敏
曾德望
肖睿
LI Min;ZENG De-Wang;XIAO Rui(Key Laboratory of Energy Thermal Conversion and Control of Ministry of Education,Southeast University,Nanjing 210096,China)
出处
《工程热物理学报》
EI
CAS
CSCD
北大核心
2020年第8期2059-2066,共8页
Journal of Engineering Thermophysics
基金
国家自然科学基金(No.51906041)
国家杰出青年基金(No.51525601)
江苏省自然科学(No.BK20190360)。
关键词
氩气纯化
化学链燃烧
低浓度杂质气体
argon gas purification
chemical looping combustion
trace amount