电感耦合等离子体质谱法测定高温合金GH4169中痕量碲

Determination of trace tellurium in superalloy GH4169 by inductively coupled plasma mass spectrometry

采用电感耦合等离子质谱法测定高温合金GH4169中痕量碲。研究了GH4169中主要成分镍、铁、铬对碲含量测定产生的基体效应,考察了其它共存元素钼、铌对碲的质谱干扰情况。通过选择适宜的碲同位素及选用干扰元素校正方程消除了质谱干扰,对标准加入法和基体匹配法进行对比,结果表明:采用基体匹配法结合干扰校正方程,4种GH4169标准物质测定值均与标示值基本吻合,测得结果的相对标准偏差均小于6%(n=5),方法检出限为0.3188μg/g,样品加标回收率为81.2%~90.7%。该方法操作简单,准确度较高,可用于高温合金GH4169中痕量碲的测定。

Trace tellurium in superalloy GH4169 was determined by inductively coupled plasma mass spectrometry(ICP-MS).The matrix interference of Ni,Fe and Cr in GH4169 was eliminated,and the mass spectrum interference of other coexisting elements Mo and Nb to tellurium was investigated.The mass spectrum interference was overcome by selecting appropriate isotopes of Te and selecting the correction equation of interfering elements.The standard addition method and matrix matching method were compared.The results showed that the determined results of four certified reference materials of GH4169 were consistent with the certified values by matrix matching method and interference correction equation.The relative standard deviations of results were all less than 6%(n=5),and the detection limit was 0.3188μg/g,the recoveries were between 81.2%and 90.7%.The method is easy and accurate,and it can be used to determine trace tellurium in superalloy GH4169.