基底偏压对磁控溅射TiAlSiN涂层微观结构、力学性能及摩擦学性能的影响

Influence of Substrate Bias on Microstructure,Mechanical and Tribological Properties of TiAlSiN Thin Films Deposited by Magnetron Sputtering

采用直流非平衡磁控溅射方法在M42高速钢表面沉积Ti/TiN/TiAlSiN多层薄膜,研究基底偏压对TiAlSiN的晶体结构、微观组织、力学及摩擦学性能的影响。结果表明:基体负偏压从40 V增加到80 V,TiAlSiN由致密的粗大柱状晶向致密纤维状细晶过渡、晶粒宽度由180 nm减小至60 nm;当负偏压大于60 V时,TiAlSiN层由fcc TiN+fcc AlN双相结构转变为fcc TiAlN单相结构;涂层硬度和弹性模量随偏压增大呈现上升趋势,当负偏压为80 V时,涂层的硬度和弹性模量分别为34.1 GPa和378 GPa;涂层的摩擦学性能随偏压的增大而先增强后降低,当负偏压为40 V时,涂层磨损率为5.0×10^-6mm^3/Nm,当负偏压为50 V时,涂层则降低至5.0×10^-6mm^3/Nm,为最低值,随着负偏压增加到80 V时,磨损率较高,约9.0×10^-6mm^3/Nm。

Multilayerd TiAlSiN/TiN/Ti coatings were deposited on M42 steel substrate by DC close-field unbalanced magnetron sputtering.The aim of this study is to investigate the influence of varying substrate bias on the microstructure,mechanical and tribological properteis of the outmost TiAlSiN layer.It was found that a transition from dense columnar grains to dense fiberous grains was observed as the substrate bias voltage increased from-40 V to-80 V,together with a reduction of the width of grain from 180 nm to 60 nm.There was also a structural transition from a mixed fcc TiN+fcc AlN phases into a single fcc TiAlN phase as the negative substrate bias increased above 60 V.Hardness and elastic modulus was observed to increase with increasing bias voltage.When the negative bias pressure is 80 V,the hardness and elastic modulus of the coating are 34.1 GPa and 378 GPa respectively.In addition,the wear rate of the TiAlSiN coating increased firstly and then decrease with increasing substrate bias.When the negative bias voltage was 40 V,the wear rate of the coating was 5.0×10^-6mm^3/Nm;when the negative bias voltage was 50 V,the coating decreased to 5.0×10^-6mm^3/Nm,which was the lowest value.When substrate bias voltage increased to 80 V,the wear rate is relatively high,about 9.0×10^-6mm^3/Nm.