不同还原程度的功能化氧化石墨烯的制备与性能研究

Preparation of functionalized graphene oxide with different reduction degree and their properties

通过3-氨丙基三甲氧基硅烷(APS)对氧化石墨烯(GO)进行功能化得到功能化氧化石墨烯(F-GO),再用水合肼对GO进行还原,通过控制还原时间制备出不同还原程度的还原氧化石墨烯(F-rGO)。利用FT-IR、XPS、Raman光谱、TEM、TG对产物的结构、形貌和性能进行表征。结果表明,APS与GO表面的羟基和羧基发生反应,共价接枝到GO表面;随着水合肼还原时间的不断增长,F-GO表面的含氧官能团数量不断下降,并且石墨烯的缺陷程度不断增大,在DMF和丙酮中的分散性更加稳定;此外,还原程度的提高使其热稳定性也有所提高。

Functionalized graphene oxide(F-GO)is obtained by functionalizing graphene oxide(GO)with 3-aminopropyltrimethoxysilane(APS),and then reduced by hydrazine hydrate.The reduced graphene oxide(F-rGO)samples with different reduction degree are prepared by controlling the reduction time.The structure,morphology and property of the samples are characterized by FT-IR,XPS,Raman spectrum,TEM and TG.It is shown that APS has reacted with hydroxyl and carboxyl groups on the surface of GO,and is grafted covalently onto the surface of GO.With the increase of reduction time of hydrazine hydrate,the number of oxygen-containing functional groups on the surface of F-GO decreases and the defect degree of graphene increases,while the dispersion of graphene in DMF and acetone becomes more stable.Besides,the improvement of reduction degree means a higher thermal stability.