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大型复合承力筒星箭连接环HPPMS离子注入与沉积

HPPMS Ion Implantation and Deposition for Large Composite Central Tube Adaptor
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摘要 基于高功率脉冲磁控溅射(HPPMS)的离子注入与沉积是一种新的星箭连接环表面处理方法,能够在星箭连接环表面制备致密、高结合力的膜层,满足热控性能和防冷焊要求。针对某复合承力筒星箭连接环的特点,进行了基于高功率脉冲磁控溅射的离子注入与沉积的相关工艺研究、防护试验,优化了膜层制备工艺参数,验证了碳纤维承力筒筒体防护效果,利用研制的专用系统进行了某大型复合承力筒星箭连接环的离子注入与沉积,热控性能和防冷焊效果明显优于阳极氧化,满足指标要求。 Ion implantation and deposition based on High Power Pulse Magnetron Sputtering(HPPMS)is a novel surface treatment method for adaptor.The film made by that technique is not only dense and with high binding strength,but also meeting the requirements for thermal control and anti⁃cold welding.The results of our HPPMS ion implantation and deposition experiments are analyzed,and the best HPPMS parameters are concluded in this paper.To prevent the large composite central tube from damage during HPPMS,protection experiments were also carried out.Finally,HPPMS ion implantation and deposition on adaptor surface were conducted successfully by using the special HPPMS system.The thermal control and anti⁃cold welding properties by HPPMS is remarkably better than that by anodization.
作者 夏振涛 王珂 韩海波 程涛 Xia Zhentao;Wang Ke;Han Haibo;Cheng Tao(Shanghai Institute of Spacecraft Equipment,Shanghai 200240,China)
出处 《西北工业大学学报》 EI CAS CSCD 北大核心 2018年第S01期56-62,共7页 Journal of Northwestern Polytechnical University
基金 上海市青年科技英才扬帆计划项目(16YF1411100)资助。
关键词 星箭连接环 表面处理 高功率脉冲磁控溅射 离子注入与沉积 adaptor surface treatment high power pulse magnetron sputtering(hppms) ion implantation and deposition
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