不同工艺下取向硅钢超薄带中Goss织构取向分析

Goss orientation analysis of ultra-thin silicon steel sheets prepared by different processes

采用"初次再结晶法"和"二次再结晶法"制备了0.10 mm和0.05 mm取向硅钢超薄带,研究了两种制备方法下高斯织构形成规律的差异;考察了"初次再结晶法"中退火时间对织构和磁性能的影响;分析了"二次再结晶法"板厚对二次再结晶的影响。结果表明,"初次再结晶法"所形成的高斯织构是单晶高斯取向晶粒的形变再结晶行为,随着退火时间的延长,强偏转立方取向逐渐被高斯取向所取代;采用"二次再结晶法"制备0.05 mm及以下厚度取向硅钢超薄带时,二次再结晶难以发生。

Ultra-thin silicon steel sheets with thickness of 0.10 mm and 0.05 mm were prepared by "primary recrystallization method" and "secondary recrystallization method", and the differences of the formation law of Goss texture of the steel prepared by the two different methods were investigated. In addition, the effect of annealing time on orientation and magnetic properties of the silicon steel sheets prepared by "primary recrystallization method" was investigated. Finally, the effect of sheet thickness on secondary recrystallization of the silicon steel sheets prepared by "secondary recrystallization method" was analyzed. The results show that the Goss texture of the silicon steel sheets prepared by the "rimary recrystallization method" is the deformation recrystallization behavior of single crystal Goss oriented grains, with the increase of annealing time, the strong deflected cubic orientation is gradually replaced by Goss orientation. Secondary recrystallization of the silicon steel sheets with thickness of 0.05 mm and below prepared by "secondary recrystallization method" is difficult to occur.