21世纪深亚微米芯片技术的新进展

Progress in the Developments of DSM IC Technology in the 21^(st) Century

着重介绍对微电子技术发展有重大意义的集成电路关键技术的进展情况 .MOS FET结构的探索创新、高K和低K绝缘材料的开发运用、铜布线芯片技术、极紫外线曝光技术以及SoC设计技术等里程碑式的进展 ,使集成电路朝着规模越来越大、图形线条越来越细、功耗越来越低、工作速度越来越快的方向不断发展 ,为 2

The latest developments of IC Technology which is the foundation of the information technology (IT) are introduced in this paper. The application of the smart structure of MOSFET,high K and low K material used as the insulator in IC,copper interconnecting technology,EUVL (extreme ultraviolet lithography) make IC smaller and smaller in size of line, lower and lower in power dissipation and faster and faster in working speed. Such developments have laid a solid foundation for the development of IT Technology in the 21 st century.