基底涂层对PS弹性回复率的影响

Influence of substrate films for photo spacer elastic recovery rate

为进一步提升液晶显示产品盒厚的稳定性,本文研究了TFT-LCD中柱状隔垫物(Photo Spacer,PS)弹性回复率(ER)与基底膜层间的关系。首先制作不同基底膜层的PS样品,然后利用SNU 3D显微镜表征PS的大小及高度,用扫描电镜(SEM)观察基底膜层的厚度,最后用动态超显微硬度计表征PS。实验结果表明,PS在空白玻璃(Bare Glass)上的ER比正常基底膜厚高3.9%(200 mN)。平坦层(Over Coat)维氏硬度越高时,PS ER越高,且随着载入压力的增大,维氏硬度差异所导致的PS ER差异越大,当载入压力为500 mN时差异达到6.3%。彩色光阻(Color Resist)膜厚由2.2μm变厚到2.5μm时,PS ER降低,载入压力为100 mN时,A、B材料PS ER分别降低3.7%、4.9%。另外对PS在基底涂层下的疲劳性进行了研究,结果表明随着压入次数增加,PS ER增加,塑性形变比例减小,25次后逐渐保持平稳。

In order to improve cell gap stability of crystal display products,the relationship between the elastic recovery rate(ER)of photo spacer(PS)and the substrate films in thin film transistor liquid crystal display(TFT-LCD)was studied in this work.Firstly,PS samples with different substrate films were obtained by photolithograph process.Then,the SNU 3D microscope was utilized to characterize the size and height of PS samples,and the thicknesses of substrate films were measured by SEM.The ER was measured by dynamic ultra micro hardness tester(DUH)at last.Test results show that the ER of PS on bare glass is 3.9%higher than on normal substrate films when the loading force is 200 mN.While the Vickers hardness of over coat(OC)film vises,the ER of PS enhances obviously especially with higher loading force.The discrepancy of material A and B increases to 6.3%with 500 mN loading force.It is also found that the ER of PS decreases with the thicknsess of the substrate film of color resist.When the color resists thickness changes from 2.2μm to 2.5μm,the ER of PS on A and B decreases from 3.7%to 4.9%.In addition,the fatigue properties of PS on its base coating films are also studied.The results show that the elastic recovery rate of PS increases with the proportion of plastic deformation decreasing,and keeps steadily after 25 times as the number of press-in increases.