摘要
We demonstrate two short-wavelength infrared avalanche photodiodes based on InAs/GaSb superlattice grown by metal-organic chemical vapor deposition.The difference between the two devices,namely,p+n-n+and p+nn-n+,is that the p+nn-n+device possesses an additional middle-doped layer to separate the multiplication region from the absorption region.By properly controlling the electric field distribution in the p+nn-n+device,an electric field of 906 kV/cm has been achieved,which is 2.6 times higher than that in the p+n-n+device.At a reverse bias of-0.1 V at 77 K,both devices show a 100%cut-off wavelength of 2.25μm.The p+n-n+and p+nn-n+show a dark current density of 1.5×10^-7 A/cm^2 and 1.8×10^-8 A/cm^2,and a peak responsivity about 0.35 A/W and 0.40 A/W at 1.5μm,respectively.A maximum multiplication gain of 55 is achieved in the p+nn-n+device while the value is only less than 2 in the p+n-n+device.Exponential nature of the gain characteristic as a function of reverse bias confirms a single carrier hole dominated impact ionization.
作者
Jia-Feng Liu
Ning-Tao Zhang
Yan Teng
Xiu-Jun Hao
Yu Zhao
Ying Chen
He Zhu
Hong Zhu
Qi-Hua Wu
Xin Li
Bai-Le Chen
Yong Huang
刘家丰;张宁涛;滕;郝修军;赵宇;陈影;朱赫;朱虹;吴启花;李欣;陈佰乐;黄勇(School of Nano-Tech and Nano-Bionics,University of Science and Technology of China,Hefei 230026,China;Key Laboratory of Nanodevices and Applications,Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China;School of Physical Science and Technology,ShanghaiTech University,Shanghai 201210,China;School of Information Science and Technology,ShanghaiTech University,Shanghai 201210,China)
基金
Project supported by the National Natural Science Foundation of China(Grant Nos.61874179,61804161,and 61975121)
the National Key Research and Development Program of China(Grant No.2019YFB2203400).