摘要
为了提高建筑装饰用不锈钢表面的耐磨性能,在脉冲电沉积过程中依次施加平行方向与垂直方向的两种磁场来制备MoS2镀层,比较镀层组织形态特征及其性能变化。研究结果表明:磁场垂直时MoS2镀层内出现了许多小尺寸晶粒,镀层致密度发生明显提升。磁场平行时各晶粒呈现均匀的分布形态,获得平整镀层表面。随着MoS2颗粒的加入量逐渐增大后,产生了更明显抑制作用,导致(200)晶面衍射峰强度明显减弱。控制磁场垂直时得到了硬度为364 HV的镀层,控制磁场平行时镀层硬度只有341 HV。提高MoS2颗粒加入量后,获得细晶强化效果,显著提高镀层硬度。磁场平行下具备良好的耐磨性能,平整性获得明显提升,有助于更多MoS2颗粒进入镀层内。与磁场垂直形成了平整镀层表面,产生大量台阶;施加平行磁场时,镀层中出现部分犁沟,引起磨损痕迹变形。采用不同工艺制得的MoS2镀层都表现出磨粒磨损的特征。
The surfaces of 316 L stainless steel,an architectural decoration material,were modified with MoS2 coatings synthesized by pulsed electrodeposition in magnetic(M-)field.The influence of the magnetic field directions on the microstructures and tribological behavior was investigated with X-ray diffraction and scanning electron microscopy.The preliminary results show that the M-field,normal or parallel to the substrate,had a major impact.Specifically,the M-field significantly improved the tribological properties of the MoS2 coatings;a normal M-field produced the more compact MoS2-coating,comprising smaller grains and stepped defects and having a hardness of 364 HV;whereas the parallel M-field synthesized the flatter MoS2 coating,consisting of more uniform grains and exhibiting a hardness of 341 HV and a stronger wear-resistance.The abrasive wear was responsible for the wear mechanism of MoS2 coatings,deposited both in the normal and/or parallel M-fields.
作者
韩向明
彭梦姣
Han Xiangming;Peng Mengjiao(Department of Engineering Management,Shanxi Vocational College of Architecture,Jinzhong 030001,China;School of Architecture and Engineering,Henan University,Kaifeng 475000,China)
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2020年第11期1012-1016,共5页
Chinese Journal of Vacuum Science and Technology
基金
河南省科技攻关项目(编号:182102310815)。
关键词
MoS2涂层
电沉积
磁场方向
微观组织
摩擦性能
MoS2 coating
Electrodeposition
Magnetic field direction
Microstructure
Friction performance