提高离子注入机晶圆机械传输效率及晶圆散热优化研究

Research on Improving Wafer Transfer Efficiency and Optimizing Wafer Temperature of Ion Implanter

针对离子注入机的晶圆传输过程,提出了一种提高晶圆传输效率的方法,在晶圆自动传输的基础上,对机械手传输动作、电机动作进行优化,节约不必要的时间消耗,提高了晶圆机械传输效率,同时开展晶圆温度技术研究,通过提升晶圆的扫描速度实现晶圆表面热量的减少,改善了工艺加工后晶圆的整体质量及性能。

The ion implanter is one of the key equipment in the semiconductor ion doping process.For the semiconductor chip production process,a method to improve wafer transfer efficiency and optimize wafer temperature is proposed.Based on the automatic wafer transfer,in the process,the robot transfer action,motor action and wafer cooling are optimized to save unnecessary time consumption,thereby improving the efficiency of wafer mechanical transfer.