摘要
多晶硅的清洗环节作为多晶硅后处理过程中的关键环节,其装备技术的发展随着近年来多晶硅生产的规模化、精细化、智能化发展也在不断的优化提升,本文回顾了多晶硅清洗装备技术的发展历程,总结了多晶硅清洗的特点,并针对当前多晶硅的产品特点,对未来多晶硅清洗装备技术进行了展望,旨在为多晶硅生产企业在清洗装备技术选择上提供指导性意见。
The cleaning process of polysilicon is the key link in the post-processing process of polysilicon.With the scale,refinement and intelligent development of polysilicon production in recent years,the development of equipment technology of polysilicon is constantly optimized and improved.This paper reviews the development history of polysilicon cleaning equipment technology,summarizes the characteristics of polysilicon cleaning,and according to the characteristics of current polysilicon products,the future development of polysilicon cleaning technology is also improved The prospect of polycrystalline silicon cleaning equipment technology is carried out in order to provide guidance for polysilicon production enterprises in the selection of cleaning equipment technology.
作者
杨永亮
石何武
张升学
郑红梅
YANG Yong-liang;SHI He-wu;ZHANG Sheng-xue;ZHENG Hong-mei
出处
《有色设备》
2020年第6期1-4,共4页
Nonferrous Metallurgical Equipment
关键词
多晶硅
清洗装置
碱洗法
酸洗法
Polysilicon
Cleaning device
Alkali washing
Acid washing