等离子体增强的磁控溅射TiSiN薄膜结构与耐蚀性

Microstructure and Corrosion Resistance of TiSiN Films Deposited by Plasma-Enhanced Magnetron Sputtering

针对磁控溅射固有磁场强度随时间衰减的问题,采用外加磁场增强真空室内等离子密度的方法,在AZ31基体上反应溅射沉积了厚度约2μm的TiSiN薄膜。应用XRD、SEM研究了等离子体增强的磁控溅射方法所制备薄膜的物相组成、结构、表面形貌,利用电化学工作站研究了等离子体增强的磁控溅射薄膜在3.5%NaCl溶液中的腐蚀行为,并与未增强等离子体制备的薄膜做了对比。结果表明:等离子体增强后,薄膜的择优取向发生改变,薄膜致密度更高,薄膜表面粗糙度、缺陷以及晶粒尺寸有所减小,且薄膜在NaCl溶液中的抗腐蚀能力更好,等离子体增强技术对于提高薄膜质量和性能效果显著。

In order to solve the problem of the inherent magnetic field intensity decreasing with time in the application of magnetron sputtering,TiSiN films with a thickness of about 2μm were deposited on AZ31 substrates by reactive sputtering using the method of external magnetic field to enhance the plasma density in a vacuum chamber.XRD and SEM were used to characterize the phase composition,structure and surface morphology of the thin films prepared by plasma-enhanced magnetron sputtering method,and electrochemical workstation was used to study the corrosion behavior of the obtained films in 3.5%NaCl solution.The comparison was made between the plasma enhanced films and unenhanced plasma films.The results showed that the plasma enhanced films could change the preferential orientation and the density was higher than the plasma unenhanced films.The surface roughness,defects and grain size of the plasma enhanced films were all reduced,and the corrosion resistance was also enhanced.The plasma enhancement technique had a significant effect on improving the quality and performance of the thin films.