Co-Re MOCVD设备反应室流场的CFD数值仿真

CFD Numerical Simulation of Flow Field in Reaction Chamber of Co-Re Chemical Vapor Deposition Equipment

以化学气相沉积Co-Re合金涂层为对象,建立反应室内部数学模型采用计算流体力学CFD方法对化学气相沉积制备Co-Re合金涂层反应室进行三维数值模拟分析,前处理采用ICEM软件划分网格,在fluent15.0中计算了反应室中基底附近流场分布,数值模拟采用非交错网格系统SIMPLE算法,以提高涂层表面均匀性为目的,研究了不同进气口形状、位置、流量大小以及压力对基底附近速度场的影响,模拟结果表明当选用直型喷头、进气口距离基底下表面L为150mm时,进气流量为150mL/min能够得到表面质量相对均匀的涂层,并且压力的变化对基底附近速度场影响不大。

Based on the chemical vapor deposition of Co-Re alloy coating,a mathematical model of the reaction chamber in the reaction chamber was established by using the CFD method of computational fluid dynamics(CFD)to simulate the threedimensional numerical simulation of the reaction chamber of the Co-Re alloy coating prepared by chemical vapor deposition.The pre treatment was used to divide the grid by ICEM software and the flow field near the basement of the reaction chamber was calculated in fluent 15.0.In the numerical simulation,the non staggered grid system SIMPLE algorithm was used to improve the uniformity of the coating surface.The influence of the shape,position,flow size and pressure on the velocity field near the substrate was studied.The simulation results showed that when the direct type nozzle and the inlet of the inlet are L as 150 mm.When the gas flow rate is 150 mL/min,the coating with relatively uniform quality can be obtained,and the pressure change has little effect on the velocity field near the substrate.