摘要
Metasurfaces have demonstrated unprecedented capabilities in manipulating light with ultrathin and flat architectures.Although great progress has been made in the metasurface designs and function demonstrations,most metalenses still only work as a substitution of conventional lenses in optical settings,whose integration advantage is rarely manifested.We propose a highly integrated imaging device with silicon metalenses directly mounted on a complementary metal oxide semiconductor image sensor,whose working distance is in hundreds of micrometers.The imaging performances including resolution,signal-to-noise ratio,and field of view(FOV)are investigated.Moreover,we develop a metalens array with polarization-multiplexed dual-phase design for a wide-field microscopic imaging.This approach remarkably expands the FOV without reducing the resolution,which promises a non-limited space-bandwidth product imaging for wide-field microscopy.As a result,we demonstrate a centimeter-scale prototype for microscopic imaging,showing uniqueness of meta-design for compact integration.
基金
The authors acknowledge the financial support from the National Key R&D Program of China(Nos.2016YFA0202103 and 2017YFA0303701)
the National Natural Science Foundation of China(Nos.91850204 and 11674167)
Tao Li thanks the Dengfeng Project B of Nanjing University for the support.The authors declare that they have no conflicts of interest.