Investigation of Heavy Ion Irradiation Effects on Microstructural and Optical Properties of Amorphous HfO_(2) Thin Films

下载PDF

导出

摘要 Amorphous HfO_(2) is widely utilized as high-k gate dielectric materials for reducing the tunneling leakage current and improving the reliability to overcome the physical limitation of traditional gate dielectric like SiO_(2)[1,2].

作者 Li Zongzhen Liu Jie Zhai Pengfei Zeng Jian Zhang Shengxia Hu Peipei Xu Lijun Ai Wensi Liu Li

机构地区不详

出处《IMP & HIRFL Annual Report》 2019年第1期108-108,共1页 中国科学院近代物理研究所和兰州重离子研究装置年报（英文版）

关键词 HfO_(2) DIELECTRIC FILMS

分类号 TN3 [电子电信—物理电子学]

引文网络
相关文献

1LI Teng,BAO Liangjin,WANG Lingyu,XIAN Liang,ZHENG Zuoxi,HUA Xiaohui.Treatment of Radioactive Waste TBP/OK by Supercritical Water Oxidation[J].Annual Report of China Institute of Atomic Energy,2019(1):166-166.
2Li Zongzhen,Liu Jie,Zhai pengfei,Liu Tianqi,Xu lijun,Zhang Shengxia,Zeng Jian,Hu Peipei.重离子辐照对高k栅介质堆叠结构电荷俘获和退俘获的影响[J].IMP & HIRFL Annual Report,2018(1):110-111.
3Xiazi Xiao,Dmitry Terentyev,Haijian Chu,Huiling Duan.Theoretical models for irradiation hardening and embrittlement in nuclear structural materials:a review and perspective[J].Acta Mechanica Sinica,2020,36(2):397-411. 被引量：2
4Dongmei Zhu,Qianwen Chen,Tingsheng Qiu,Guanfei Zhao,Xihui Fang.Optimization of rare earth carbonate reactive-crystallization process based on response surface method[J].Journal of Rare Earths,2021,39(1):98-104. 被引量：2
5Nada ElBaz,Gomaa El-Damrawi,Amr M. Abdelghany.Structural Role of CeO2in the Modified Borate Glass-Ceramics[J].New Journal of Glass and Ceramics,2021,11(1):34-43. 被引量：1
6Li Zongzhen,Liu Jie,Zhai Pengfei,Liu Tianqi,Yao Huijun,Xu lijun,Zhang Shengxia,Hu Peipei.二氧化铪基电容器件的辐照效应研究[J].IMP & HIRFL Annual Report,2017(1):112-113.
7Cheng-Feng Du,Xiaoli Sun,Hong Yu,Wei Fang,Yao Jing,Yonghui Wang,Shuiqing Li,Xianhu Liu,Qingyu Yan.V4C3Tx MXene:A promising active substrate for reactive surface modification and the enhanced electrocatalytic oxygen evolution activity[J].InfoMat,2020,2(5):950-959. 被引量：8
8Yuxi Wang,Yida Chen,Yong Zhang,Zhaoxin Zhu,Tao Wu,Xufeng Kou,Pingping Ding,Romain Corcolle,Jangyong Kim.Experimental Characterization of ALD Grown Al2O3Film for Microelectronic Applications[J].Advances in Materials Physics and Chemistry,2021,11(1):7-19. 被引量：1

IMP & HIRFL Annual Report

2019年第1期

浏览历史

内容加载中请稍等...

Investigation of Heavy Ion Irradiation Effects on Microstructural and Optical Properties of Amorphous HfO_(2) Thin Films

相关作者

相关机构

相关主题

浏览历史