单晶硅晶格间距的测量技术进展及应用

Progress and Application on the Measurement Technique of Single Crystal Silicon Lattice Spacing

单晶硅晶格间距是许多重要物理常数测量的基础。本文介绍了硅晶格间距测量技术的发展历程,包括X射线干涉仪直接测量和晶格比较仪间接测量两种方法,以及影响测量结果不确定度的关键因素。得益于晶格间距测量的进展,在纳米尺度,硅晶格间距被国际计量局(BIPM)批准成为新的米定义复现形式。最后介绍了硅晶格在计量学中的应用,以及基于硅晶格实现纳米几何量测量的溯源体系的研究趋势。

Lattice spacing of single crystal silicon is the fundamental of measurement of some physical constants.In this paper,the progress of the silicon lattice spacing measurement technique is introduced,including X-ray interferometer for direct measurement and lattice comparator for indirect measurement,and the key factor affecting the uncertainty of lattice spacing measurement are discussed.Due to the development of silicon lattice spacing measurement,the Si lattice spacing is used as a secondary realization of the definition of the metre at nanoscale,approved by BIPM.At last,the application of lattice measurement in metrology and research trends of the traceability system for nano dimension metrology based on the lattice are introduced.