摘要
介绍了氧化铈及其复合磨料的主要制备方法,描述了该材料在化学机械抛光(CMP)应用中的研究进展。针对当前研究所面临的问题进行简要分析,并展望了其今后的研究方向。
Based on the research done at home and abroad,this article introduces the main preparation methods of cerium oxide and its composite abrasives,and describes the research progress of this material in the application of chemical me⁃chanical polishing(CMP).A brief analysis of the problems faced by the current research institute,and a prospect for its fu⁃ture research directions.
作者
邹兰梅
ZOU Lan-mei(School of Chemistry and Chemical Engineering,Hefei University of Technology,Hefei 230009,China)
出处
《安徽化工》
CAS
2021年第1期13-16,共4页
Anhui Chemical Industry
关键词
氧化铈
复合磨料
化学机械抛光
制备
CeO2
composite abrasive
chemical mechanical polishing
preparation
