化学气相沉积法制备高纯硼粉的技术进展

A Technological Review of the Preparation of High Purity Boron Powder by Chemical Vapor Deposition

高纯硼是高技术和电子信息的重要材料,是军工和高科技不可缺少的一种重要的战略物资。本文阐述了氢和卤化硼、卤化硼及硼烷分别在金属基体表面、硼棒基体表面及采用流化床技术化学气相沉积制备高纯硼粉的几种不同制备方法,分析比较了各方法的优缺点,总结出以硼烷为原料,采用流化床技术可以制备产率高、纯度高的硼粉;探讨了副产物回收方法,并进一步提出将流化床和化学气相沉积技术相结合(FB-CVD),生产高纯硼粉具有高效、经济的特点,并可实现产业化。

High purity boron is an important material for high-tech and electronic information.It is an important strategic material indispensable for military and high-tech.In this paper,hydrogen and boron halide,boron halide,borane respectively on the surface of metal substrate,boron rod substrate and chemical vapor deposition by fluidized bed technique to prepare boron powder were expounded.The advantages and disadvantages of each method were analyzed and compared.High-yield and high purity boron powder by using borane and introducing fluidized bed technology was prepared.The method of recovery of by-products was discussed,and a method of combing of fluidized bed with chemical vapor deposition(FB-CVD)to produce economic,industrial high purity boron powder was further proposed.