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Design technology co-optimization towards sub-3 nm technology nodes 被引量:2

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摘要 Over the past half century,Moore’s Law has played a crucial role in the development of the semiconductor field,which depends on straightforwardly dimensional scaling with approximately a two-year cadence.Significant benefits of performance,power,area,and cost(PPAC)in microchips are expected at each technology node.However,aggressive pitchbased scaling by resolution enhancement techniques becomes increasingly challenging to sustain.
出处 《Journal of Semiconductors》 EI CAS CSCD 2021年第2期6-8,共3页 半导体学报(英文版)
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