摘要
依据MBR污染的原理及化学清洗的流程,设计了基于PLC的离线化学清洗流程控制系统,实现了离线化学清洗现场无人值守的自动控制。
According to the principle of MBR pollution and the process of chemical cleaning,the off-line chemical cleaning process control system based on PLC is designed,which realizes the unattended automatic control of off-line chemical cleaning field.
作者
韦树铌
WEI Shuni(Shanghai Sipai Intelligent Systems Co.,Ltd.,Shanghai 200233,China)
出处
《流体测量与控制》
2021年第1期60-64,共5页
Fluid Measurement & Control
