摘要
阐述光刻设备中冷却水系统污染控制,针对水系统运行时产生的污染物,研究其产生机理,分析其来源,定义其控制手段,为系统可靠运行提供保障。
This paper describes the pollution control of the cooling water system in the lithography equipment. Aiming at the pollutants produced by the water system during operation, the generation mechanism is studied, the source is analyzed, and the control means are defined, so as to provide guarantee for the reliable operation of the system.
作者
王明
WANG Ming(Shanghai Micro Electronics Equipment(Group)Co.,Ltd.,Shanghai 201203,China)
出处
《集成电路应用》
2021年第3期28-30,共3页
Application of IC
基金
上海市发展和改革委员会(XA4300089-2017-604)先进封装光刻机产业化课题。
关键词
集成电路制造
水系统
机理研究
污染控制
IC manufacturing
water system
mechanism research
pollution control
