摘要
脉冲激光沉积技术作为一种简单、通用和高效的薄膜生长技术,在科研和工业领域具有广泛的应用前景。在许多高科技应用中对薄膜质量的要求日趋严格,如何减少或消除薄膜内部和表面的微粒成为了亟待解决的问题。介绍了脉冲激光沉积技术中微粒出现的根源并讨论了各种微粒控制技术的优缺点,最后简要展望了脉冲激光沉积微粒控制技术的发展趋势。
Pulsed laser deposition has broad applications in scientific research and industry as a simple,versatile,and efficient film growth technology. The requirements for film quality are becoming more and more stringent in many high-tech applications. Reducing or eliminating the particulates inside and on the surface of a film has become an urgent problem. This paper introduces the source of particulates in pulsed laser deposition and discusses the advantages and disadvantages associated with various particulate control techniques. Finally,the trend of particulate control based on pulsed laser deposition is discussed.
作者
代守军
余锦
貊泽强
王金舵
何建国
王晓东
孟晶晶
王宝鹏
Dai Shoujun;Yu Jin;Mo Zeqiang;Wang Jinduo;He Jianguo;Wang Xiaodong;Meng Jingjing;Wang Baopeng(Aerospace Information Research Institute,Chinese Academy of Sciences,Beijing 100094,China;University of Chinese Academy of Sciences,Beijing 100049,China)
出处
《激光与光电子学进展》
CSCD
北大核心
2021年第1期52-62,共11页
Laser & Optoelectronics Progress
基金
国家重点研发项目(2018YFB0407400)
中国科学院科研仪器设备研制项目(YJKYYQ20170035)
中国科学院光电研究院创新项目(Y70B15A13Y)。
关键词
激光技术
脉冲激光沉积技术
微粒
光滑薄膜生长
laser technique
pulsed laser deposition technology
particulates
smooth film growth