MBE生长InAs/GaSb Ⅱ类超晶格材料的界面控制方法分析

Analysis of Interface Control Methods for InAs/GaSb Type-Ⅱ Superlattice Materials Grown by MBE

本文系统地介绍了MBE外延生长In As/Ga SbⅡ类超晶格材料的界面控制方法,主要包括生长中断法、表面迁移增强法、V族元素浸润法和体材料生长法。短波(中波)In As/Ga Sb超晶格材料界面采用混合(mixed-like)界面,控制方法以生长中断法为主;长波(甚长波)超晶格材料界面采用InSb-like界面,控制方法采用表面迁移增强法(migration-enhancedepitaxy,MEE)或Sbsoak法及体材料生长相结合。讨论分析了InAs/GaSb超晶格材料界面类型选择的依据,简述了界面控制具体实施理论,以及相关研究机构对于不同红外探测波段的超晶格材料界面类型及控制方法的选择。通过界面结构外延生长工艺设计即在界面控制方法的基础上进行快门顺序实验设计,有效地提高界面层的应力补偿效果,这对于长波、甚长波及双色(甚至多色)超晶格材料的晶体质量优化和器件性能提升具有重要意义。

This article systematically introduces interface control methods for the MBE growth of InAs/GaSb type-Ⅱ superlattice materials, including the interrupted growth epitaxy method, migration-enhanced epitaxy, V group element soak method, and bulk material growth method. The short-wavelength(mid-wavelength) InAs/GaSb superlattice material interface adopts a mixed-like interface, and the control method is mainly the interrupted growth epitaxy method, the long-wavelength(very long-wavelength) superlattice material interface adopts the InSb-like interface, and the control method adopts the migration-enhanced epitaxy(MEE) or Sb soak method combined with bulk material growth. The basis for selecting the interface type of InAs/GaSb superlattice material is discussed and analyzed, and the specific implementation theory of interface control is briefly described, along with the selection of interface types and control methods of superlattice materials in different infrared detection wavelength bands by related research institutions. To effectively improve the stress compensation effect of the interface layer, the interface structure epitaxial growth process design, that is, the experimental design of different shutter sequences based on the interface control method, was used. This is of great significance for the optimization of the crystal quality and device performance of long-wave, very long-wave, and two-color(even multi-color) superlattice materials.