减少底部抗反射涂层(BARC)的缺陷:对优化与分离过滤过程和打胶过程的研究

Reducing the Defects of Bottom Anti-Reflective Coatings(BARC):Research on the Optimization and Separation of Filtration Process and Gluing Process

半导体器件制造业是当今世界上最清洁的制造业之一。在当今最先进的晶圆厂当中,所有的物质都被过滤到最小的粒径。这种做法对气体来说是相当容易的,但是过滤液体时相对较难,特别是光化学物质,如底部抗反射涂层(BARC),过滤器可能会出现堵塞、过滤速率下降的问题,进而导致通过过滤器的压降增加,或者过滤器退化。论文采用三种不同的底部抗反射涂层,基于泵中的不同粒径的过滤介质,并分别采用不同的速率,研究打胶过程和过滤过程的相互作用。

Semiconductor device manufacturing industry is one of the cleanest manufacturing industries in the world today.In today's most advanced fabs,all materials are filtered to the smallest particle size.This method is quite easy for gas,but it is relatively difficult to filter liquid,especially for photochemical substances,such as bottom anti-reflective coatings(BARC).The filter may be blocked and the filtration rate will decrease,which will lead to the increase in the pressure drop through the filter or deterioration of the filter.The paper uses three different bottom anti-reflective coatings,based on the filter media with different particle sizes in the pump,and uses different speed rates to study the interaction between the gluing process and the filtration process.