高致密度FeNi纳米颗粒薄膜制备与性能研究

Preparation and properties of FeNi nanoparticle films with high density

传统磁控溅射装置制备的纳米颗粒薄膜粒径不均一并且实现粒径大小调控比较困难。本研究采用电场辅助沉积技术,在沉积平台施加5~30 kV的电场,以Si(100)为衬底制备了一系列纳米颗粒粒径均一的高致密度FeNi纳米颗粒薄膜材料。通过XRD、SEM以及VSM测量,研究了不同沉积电场下FeNi纳米颗粒薄膜的结构、形貌和磁性能。利用单端口短路微带线法对0.5~5.5 GHz范围内的微波磁谱进行表征。实验结果表明:沉积电场越大,纳米颗粒粒径均一且薄膜的致密度越高,越有利于薄膜综合磁性能的改善和饱和磁化强度增大。薄膜材料微波磁谱表明,电场辅助沉积技术制备的软磁薄膜材料能够在GHz频段得到广泛应用。

The nanoparticle size of the thin films prepared by traditional magnetron sputtering equipment is non-uniform and difficult to control.Fe50Ni50 nanoparticle films with a particle size of about 6 nm are prepared on Si(100)substrates by electric field-assisted deposition.An electric field of 5~30 kV is applied on the deposition platform during the film's manufacture to obtain high stacking density and superior in plane soft magnetic properties in the films.The structure and magnetic properties of the films are characterized by X-ray diffraction(XRD),scanning electron microscope(SEM)and vibrating sample magnetometer(VSM).The microwave permeability spectra over the frequency range of 0.5~5.5 GHz are measured by a shorted microstrip transmission line perturbation method.The results show that all samples exhibited a high stacking density has significant effect on improvement of saturation magnetization for our samples.Based on the results of the microwave permeability spectra,it is found that the samples with higher saturation magnetization have excellent microwave response.These results indicate that magnetic softness and microwave behavior of FeNi nanoparticle films can be modulated by applying electric field during deposition.