容性耦合等离子体中电子加热过程及放电参数控制

Electron heating dynamics and plasma parameters control in capacitively coupled plasma

容性耦合等离子体放电因在工业界有重要的应用价值而受到广泛关注.对于容性耦合等离子体放电的研究主要集中于对等离子体参数的控制,以实现更好的工艺效果,例如高深宽比刻蚀等.而关于等离子体参数的调控主要分为气体、腔室以及源这三个方面.改变这些外部参数,可以直接影响鞘层的动力学过程以及带电粒子的加热过程,进而实现对电子和离子能量、通量,等离子体均匀性,中性基团的密度等的控制,最终提高工艺质量和生产效率.本文梳理了近些年容性耦合等离子体研究的几个主要方向,尤其对等离子体放电中非常基础且重要的电子加热动力学问题进行了详尽的讨论,并重点介绍了一些通过外部放电参数调控容性耦合等离子体放电的手段和相关的研究热点.

Capacitively coupled plasma(CCP)has gain wide attention due to its important applications in industry.The researches of CCP mainly focus on the discharge characteristics and plasma parameters under different discharge conditions to obtain a good understanding of the discharge,find good methods of controlling the charged particle properties,and improve the process performance and efficiency.The controlling of plasma parameters is based on the following three aspects:gas,chamber,and power source.Changing these discharge conditions can directly influence the sheath dynamics and the charged particle heating process,which can further influence the electron and ion distribution functions,the plasma uniformity,and the production of neutral particles,etc.Based on a review of the recent years’researches of CCP,the electron heating dynamics and several common methods of controlling the plasma parameters,i.e.voltage waveform tailoring,realistic secondary electron emission,and magnetized capacitively coupled plasma are introduced and discussed in detail in this work.