溅射功率对原位退火钴酸锂薄膜性能的影响

Effects of The Sputtering Power on Properties of In-situ Annealed LiCoO Thin Films

本文采用射频磁控溅射技术,在高温下制备了原位退火的钴酸锂薄膜,并研究了溅射功率对其性能的影响。结果表明,随着溅射功率的增加,钴酸锂薄膜结晶颗粒长大,生长速率增加,首次放电比容量增大且循环性能提升。200W溅射制备的钴酸锂薄膜首次放电比容量可达47μAh·cm-2μm-1,并表现出较好的循环性能。

In this paper, in-situ annealed LiCoO2 thin films were prepared by RF magnetron sputtering at high temperature, and the effects of sputtering power on their properties were studied. The results show that with the increase of the sputtering power, the crystalline particles grow up, the growth rate increases, the first discharge capacity increases and the cycle performance improves. The first discharge specific capacity of LiCoO2 film prepared at 200 W can reach 47 μAh cm-2μm-1 with good cycle stability.