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基于层叠式夹持超薄蓝宝石晶片双平面加工实验研究

Experimental Research on Double-sides Processing of Ultra-thin Sapphire Wafer Based on Layer Stacked Clamping
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摘要 目的针对超薄蓝宝石晶片的双平面加工,研究基盘表面高度差对工件平面度的影响,确定双平面加工超薄蓝宝石晶片的有效性。方法通过多种方式得到具有不同表面高度差(高度差分别为5.3、9.8、19.9、29.7μm)的基盘,利用层叠式夹持方法对超薄蓝宝石晶片进行夹持(厚度0.17mm)并进行双平面加工,获得不同高度差下的工件平面度。分别采用层叠式夹持方法及石蜡粘接的方法对超薄蓝宝石晶片进行双平面加工,通过对比实验验证层叠式夹持方法的有效性。结果在4种不同表面高度差下加工的超薄蓝宝石晶片,其平面度随着高度差的增大而增大,但其增大的趋势远小于基盘平面度变化的趋势。层叠式夹持方式及石蜡粘接方式均可实现超薄蓝宝石的双平面加工,两者相差较小,层叠式夹持方式最终可获得表面粗糙度Ra=1.4 nm、平面度PV=0.968μm的光滑表面。结论基盘表面高度差应不低于超薄蓝宝石晶片的目标平面度,层叠式夹持方式在加工效果上与石蜡粘接方式相当,但单位时间内的加工效率高于石蜡粘接方式,具有较好的工程应用前景。 The purpose is to study the influence of the height difference of the substrate surface on the flatness of the workpiece and determine the double-sides processing effectiveness of ultra-thin sapphire wafers.Obtain the different height differences of baseplates with different surfaces(height difference of 5.3μm,9.8μm,19.9μm,29.7μm)through various methods.By using the layer stacked clamping to clamp the ultra-thin sapphire wafer(thickness 0.17 mm)and perform double-sides processing,thus obtaining the flatness of the workpiece under different height differences.The two-layer processing of ultra-thin sapphire wafers is carried out by using the layer stacked clamping method and paraffin bonding method respectively,and the effectiveness of the layer stacked clamping method is verified through comparative experiments.The result shows that the flatness of ultra-thin sapphire wafers increases with the increase of height difference under four different surface height differences,but the increasing trend is far less than the base plate flatness change trend.Layer stacked clamping method and the paraffin bonding method can realize the double-plane processing of ultra-thin sapphire,and the difference between them is small.The layer stacked clamping method can finally obtain a smooth surface with surface roughness Ra=1.4 nm and flatness PV=0.968μm.Through experimental analysis and verification,it is proved that the height difference of the baseplate surface should smaller than the target flatness of the ultra-thin sapphire wafer.The layer stacked clamping method is equivalent to the paraffin bonding method in processing effect,but the processing efficiency per unit time is higher than the paraffin bonding method,which has a good engineering application prospect.
作者 陈芝向 袁巨龙 杭伟 王勤峰 许良 吕冰海 CHEN Zhi-xiang;YUAN Ju-long;HANG Wei;WANG Qin-feng;XU Liang;LYU Bing-hai(Ultra-precsion Machining Center,Zhejiang University of Technology,Hangzhou 310023,China;TDG Holding Co.,Ltd,Haining 314412,China)
出处 《表面技术》 EI CAS CSCD 北大核心 2021年第5期340-347,共8页 Surface Technology
基金 浙江省公益技术研究项目(LGG19E050021) 国家自然科学基金项目(51575492,51775508)。
关键词 层叠式 超薄蓝宝石 双平面加工 平面度 抛光 layer stacked ultra-thin sapphire wafer double-sides processing flatness polishing
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  • 1朱守星,丁建宁,范真,李长生,蔡兰,杨继昌.纳米GeSb_2Te_4薄膜在大气环境中的摩擦性能研究[J].摩擦学学报,2004,24(5):411-414. 被引量:4
  • 2聂辉,陆炳哲.蓝宝石及其在军用光电设备上的应用[J].舰船电子工程,2005,25(2):131-133. 被引量:48
  • 3王娟,刘玉岭,檀柏梅,李薇薇,周建伟.蓝宝石衬底片的精密加工[J].微电子学,2006,36(1):46-48. 被引量:12
  • 4鲁聪达.高亮度LED蓝宝石衬底低损伤研磨机理研究[D].杭州:浙江工业大学,2007.
  • 5Saito T, Hirayama T, Yamamoto T, et al. Lattice Strain and Dislocations in Polished Surfaces on Sapphire[J]. J. Am. Ceram. Soc., 2005,88 (8) : 2277- 2285.
  • 6Niu Xinhuan, Liu Yuling, Tan Baimei, et al. Method of Surface Treatment on Sapphire Substrate[J]. Trans. Nonferrous Met. Soc. China, 2006,16 :732- 734.
  • 7王彦松.单晶α相氧化铝衬底基板平坦化加工研究[D].台北:台湾科技大学,2003.
  • 8许胜智.多重区段化学机械研磨:多变量与逐批控制[D].台北:台湾大学,2003.
  • 9Williams J A, Hyncica A M. Mechanisms of Abrasive Wear in Lubricated Contacts[J]. Wear, 1992, 152:57-74.
  • 10Chang Y P, Hashimura M,Dornfeld D A. An Investigation of Material Removal Mechanisms in Lapping with Grain Size Transition[J]. Trans. of the ASME,Journal of Manufacturing Science and Engineering, 2000,122 (2) : 413-419.

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