摘要
对于制备复杂、致密、表面精度高的Si_(3)N_(4)陶瓷零件,光固化相比其他的增材制造技术具有不可比拟的优势。本文分别从光固化氮化硅陶瓷的浆料体系、浆料的流变性能及固化性能分析,详细阐述了光固化Si_(3)N_(4)陶瓷的研究现状与应用,并介绍了它们的发展趋势和各自的优缺点,并对今后的进一步发展进行了展望。
For the preparation of Si_(3)N_(4) ceramic parts with complex,dense and high surface precision,photocuring has incomparable advantages compared with other additive manufacturing technologies.Based on the analysis of slurry system,rheological properties and curing performance of photocurable Si_(3)N_(4) ceramics,the research status and application of the photocurable Si_(3)N_(4) ceramics were described in detail,and their development trend,advantages and disadvantages were introduced,and the further development in the future was prospected.
作者
刘耀
肖永江
易琪
占丽娜
LIU Yao;XIAO Yongjiang;YI Qi;ZHAN Lina(College of Mechanical and Electronic Engineering,Pingxiang University,Pingxiang 337000,China)
出处
《中国陶瓷》
CAS
CSCD
北大核心
2021年第5期11-16,共6页
China Ceramics
基金
江西省科技厅重点研发项目(20203BBE53053)。
