碳化硅电子行业纯水生产工程实例

An Engineering Example of Pure Water Production in Silicon Carbide Electronics Industry

随着我国半导体行业的快速发展,碳化硅电子行业对纯水的使用要求越来越高。采用UF超滤系统+两级RO反渗透系统+EDI电除盐系统+离子交换系统+终端超滤系统的工艺制备生产所需纯水。其中,UF系统除去水中主要的大分子有机和无机悬浮物;RO系统进行脱盐处理;EDI装置进一步深度处理溶解离子;抛光树脂及终端过滤系统深度处理小分子有机物和细菌,最终得到出水电阻率≥17 MΩ.cm的纯水。该套工艺为碳化硅行业纯水生产技术提供参考。

With the rapid development of China's semiconductor industry,the silicon carbide electronics industry has increasingly higher requirements for the use of pure water.This engineering example used an UF ultrafiltration system+two-stage RO reverse osmosis system+EDI electric desalination system+ion exchange system+terminal ultrafiltration system for the pure water preparation process.Among them,the UF system was mainly used to remove large organic molecules in water,then inorganic suspended solids;and RO system for desalination treatment;EDI device for further treatment of dissolved ions;finally,polishing resin and terminal filtration system for in-depth treatment of small molecule organics and bacteria,and finally obtained pure water with resistivity greater than or equal to 17 MΩ.cm.This set of processes provides a reference for pure water production technology in the silicon carbide industry.