一种废磷酸基蚀刻液的再生利用工艺

Research on the recycling process of etching solution with phosphate acid

探讨薄膜液晶显示屏行业与半导体芯片厂废磷酸基蚀刻液的异同,对薄膜液晶显示屏行业产生的磷酸基蚀刻液废液的产生背景和处置利用方式进行了研究。通过研究、分析和实践提出了一种半导体芯片厂废磷酸蚀刻液的资源利用工艺:找出了一种絮状物去除剂A,使用试剂A可将废磷酸基蚀刻液中的絮状物通过化学反应的方式去除,将絮状物除后的磷酸经过中和反应、结晶、离心和干燥等工序可制备出满足国家和行业标准的磷酸二氢钾产品。通过以上工艺制备的产品满足工业品品质要求,按照危废鉴定准则,不属于危险废弃物,可作为产品进行市场销售,从而实现了资源的再利用。

The similarities and differences between waste phosphoric acid etching solution produced by thin film liquid crystal display(TFT-LCD waste etching solution with phosphoric acid)industry and semiconductor chip factory were discussed.The background and disposal and utilization of etching solution with phosphoric acid produced by thin film liquid crystal display(TFT-LCD etching solution with phosphoric acid)industry were studied.Through analysis and practice research,this paper proposed a semiconductor chip plant resource utilization technology of acid etching liquid with phosphoric:An reagent of floc remover A was found out,with which the floc can be removed by means of chemical reaction.Then through the neutralization reaction,crystallization,centrifugal and drying process can be prepared to meet national and industry standards of potassium dihydrogen phosphate product.The products prepared by the above processes can meet the quality requirements of industrial products and are not hazardous wastes according to the identification criteria of hazardous wastes.They can be marketed as products,thus realizing the reuse of resources.