微米金刚石聚晶薄膜场发射点的研究

Study on Field Emission Point of Micron Diamond Polycrystalline Film

采用微波等离子化学气相沉积方法,以甲烷和氢气为反应气体,在镀有金属钛的陶瓷衬底上,制备了微米金刚石聚晶薄膜。利用扫描电镜、拉曼光谱、X射线光电子能谱对薄膜的化学组成、微观结构和表面形貌进行了表征。用二级结构的场发射仪和扫描隧道显微镜研究了薄膜的场发射性能,结果表明微米金刚石聚晶薄膜发射点主要来源于聚晶颗粒。进一步研究了单个聚晶颗粒表面不同区域的发射性能,发现多种因素对场发射的性能有影响。

In this study,micron diamond polycrystalline films were prepared on the ceramic substrate coated with titanium by microwave plasma chemical vapor deposition method,with the mixed gases of methane and hydrogen as the reactive gases.The chemical composition,microstructure and surface morphology of the films were analyzed by SEM,Raman spectroscopy and X-ray experiments.The field emission performance of the thin films was studied by the field emission instrument of the secondary structure and scanning tunneling microscope,and the results indicated that the emission point of the micron diamond polycrystalline film mainly originated from the polycrystalline particles.The emission properties of different areas on the surface of single polycrystalline particles were further studied,and it is found that the field emission property will be affected by various factors.