图形化FeNi纳米颗粒薄膜制备与性能研究

Preparation and properties of patterned FeNi nanoparticle films

采用电场辅助沉积技术和光刻剥离工艺,在5~40 kV沉积电场作用下,以Si(100)为衬底,制备一系列条纹宽度为40μm的Fe50Ni50纳米颗粒薄膜材料。采用XRD、SEM、AFM及VSM等测试方法,研究薄膜结构、形貌和磁性能;用单端口短路微带线法对其微波性能进行表征。结果表明:增加沉积电场大小,可方便、有效实现条纹结构Fe50Ni50纳米颗粒薄膜饱和磁化强度MS和面内单轴磁各向异性场Hk值同时提高,使薄膜铁磁共振频率向更高频段移动。

Conventional ultra-violet photolithography and lift-off methods were adopted to prepare strip-patterned films with strip width of 40 μm on Si(100)substrates. The patterned FeNi nanoparticle films were prepared by electric field-assisted deposition technique with the electric field 5-40 kV. The structure and magnetic properties of the films were characterized by X-ray diffraction(XRD),scanning electron microscope(SEM),atomic force microscope(AFM)and vibrating sample magnetometer(VSM). The microwave permeability spectra were measured by a shorted micro-strip transmission line perturbation method. The results show that the application of electric field is very effective to improve the in-plane magnetic anisotropy field and saturation magnetization simultaneously for strip-patterned films,equipping them with the higher ferromagnetic resonance frequency.