期刊文献+

磁控溅射过饱和固溶CuCr合金薄膜微观结构及其力学性能研究 被引量:1

Study on the Microstructure and Mechanical Properties of Magnetically Controlled Sputtering Supersaturated Solid CuCr Alloy Films
下载PDF
导出
摘要 CuCr合金被广泛应用于电接触材料,过饱和固溶的CuCr合金薄膜,其微观结构及力学性能与Cu和Cr两相组成的假合金不同。本文利用磁控溅射方法制备了非平衡态过饱和固溶的CuCr合金薄膜,利用X射线、透射电镜,扫描电镜,纳米压入仪,研究了在整个Cu和Cr成份比例范围内薄膜的微观结构、表面形貌和力学性能的变化规律,发现过饱和固溶CuCr合金薄膜的硬度随着Cr含量的变化,呈现双峰形,强化机制主要是固溶强化和细晶强化。在Cu和Cr原子比大于61∶39时,薄膜的结构从面心立方结构(FCC)转变为体心立方结构(BCC),当Cr原子含量为39%时,表面呈现较粗大的三棱锥形貌,此时硬度和弹性模量在整个成份比例范围内最低。 Copper chromium(CuCr) alloys are widely used in electro-contact materials, and the microstructure and mechanical properties of the supersaturated solid solution CuCr alloy films are different from those of the pseudo-alloys composed of Cu and Cr two phases.In this paper, the non-equilibrium supersaturated CuCr solidified alloy film was prepared by magnetron sputtering deposition, and the microstructure, surface morphology, and mechanical properties of films were studied by X-ray diffraction, transmission electron microscope, scanning electron microscope, and nano-indenter in the complete concentration range.The hardness of supersaturated CuCr solidified alloy film presents the double-peaked shape with the change of Cr content, and the strengthening mechanism is mainly solid solution strengthening and grain boundary strengthening.The phase transition from a face-centered cubic structure(FCC) to a body-centered cubic structure(BCC) in CuCr alloy film occurs when the ratio of Cu atom to Cr atom is greater than 61∶39,and the surface morphology of the film is a larger pyramid shape when the content of Cr is 39%;meanwhile, the hardness and elastic modulus are the lowest in the whole composition ratio range.
作者 苗晓军 李凯 钱旦 李玉楼 杨波 李雁淮 庞亚娟 郝留成 宋忠孝 MIAO Xiaojun;LI Kai;QIAN Dan;LI Yulou;YANG Bo;LI Yanhuai;PANG Yajuan;HAO Liucheng;SONG Zhongxiao(Pinggao Electic Co.,Ltd,Pingdingshan 467001,China;State Key Laboratory for Mechanical Behavior of Materials,Xi’an Jiaotong University,Xi'an 710049,China)
出处 《真空科学与技术学报》 CAS CSCD 北大核心 2021年第5期464-471,共8页 Chinese Journal of Vacuum Science and Technology
基金 国家电网有限公司总部科技项目资助,(项目名称:126 kV真空灭弧室关键工艺技术研究及应用)。
关键词 CuCr合金薄膜 磁控溅射 微观结构 力学性能 CuCr alloy film Magnetron sputtering Microstructure Mechanical properties
  • 相关文献

参考文献2

二级参考文献43

共引文献18

引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部