高灵敏度开尔文探针力显微镜测量方法及其研究现状

High-Sensitivity Kelvin Probe Force Microscope Measurement Method and Its Research Status

开尔文探针力显微镜(KPFM)不仅能够表征多种平整材料的表面形貌,还能对材料表面电势进行纳米级的成像。简单介绍了KPFM的基本工作原理与接触电势差(CPD)的概念,并介绍了幅度调制模式KPFM(AM-KPFM)、频率调制模式KPFM(FM-KPFM)与外差幅度调制模式(HAM-KPFM)这三种重要测量方法及其应用。系统综述了KPFM的国内外应用研究现状,详细介绍了其在金属纳米结构、半导体纳米结构表征方面的超高灵敏度与分辨率,总结了其在多种领域电特性表征中的广泛应用。最后对不同工作模式的KPFM进行了对比总结,展望了KPFM的未来发展。

Kelvin probe force microscope(KPFM)can characterize the surface morphologies of various flat materials and image the surface potential of materials at nanometer level.The basic working principle of KPFM and the concept of contact potential difference(CPD)are briefly introduced,and three important measurement methods of amplitude modulation mode KPFM(AM-KPFM),frequency modulation mode KPFM(FM-KPFM)and heterodyne amplitude mo-dulation mode KPFM(HAM-KPFM)and their applications are introduced.The application research status of KPFM at home and abroad is systematically reviewed.The ultra-high sensitivity and resolution of KPFM in the characterization of metal nanostructures and semiconductor nanostructures are introduced in detail.The wide application of KPFM in the characterization of electrical properties in many fields is summarized.Finally,KPFMs with different working modes are compared and summarized,and the future development of KPFM is prospected.