摘要
TiO_(2) thin films were prepared on Pt/Ti/SiO_(2)/Si substrate by laser chemical vapor deposition(LCVD)method.The effects of laser power(P_(L))and total pressure(p_(tot))on the microstructure of TiO_(2) thin films were investigated.The deposition temperature(T_(dep))was mainly affected by P_(L),increasing with P_(L) increasing.The single-phase rutile TiO_(2) thin films with different morphologies were obtained.The morphologies of TiO_(2) thin films were classified into three typical types,including the powdery,Wulff-shaped and granular microstructures.p_(tot) and T_(dep) were the two critical factors that could be effectively used for controlling the morphology of the films.
基金
This work was supported in part by the Global COE Program of the Materials Integration,Tohoku University,and the International Science and Technology Cooperation Program of China(Grant No.2009DFB50470)
This work was also supported in part by the International Science and Technology Cooperation Project of Hubei Province(Grant No.2010BFA017)and the 111 Project of China(Grant No.B13035).
