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Trigger mechanism of PDSOI NMOS devices for ESD protection operating under elevated temperatures

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摘要 Trigger characteristics of electrostatic discharge(ESD)protecting devices operating under various ambient temperatures ranging from 30℃to 195℃are investigated.The studied ESD protecting devices are the H-gate NMOS transistors fabricated with a 0.18-μm partially depleted silicon-on-insulator(PDSOI)technology.The measurements are conducted by using a transmission line pulse(TLP)test system.The different temperature-dependent trigger characteristics of groundedgate(GGNMOS)mode and the gate-triggered(GTNMOS)mode are analyzed in detail.The underlying physical mechanisms related to the effect of temperature on the first breakdown voltage V_(T1)investigated through the assist of technology computer-aided design(TCAD)simulation.
作者 Jia-Xin Wang Xiao-Jing Li Fa-Zhan Zhao Chuan-Bin Zeng Duo-Li Li Lin-Chun Gao Jiang-Jiang Li Bo Li Zheng-Sheng Han Jia-Jun Luo 王加鑫;李晓静;赵发展;曾传滨;李多力;高林春;李江江;李博;韩郑生;罗家俊(Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;Key Laboratory of Science and Technology on Silicon Devices,Chinese Academy of Sciences,Beijing 100029,China;University of Chinese Academy of Sciences,Beijing 100029,China)
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第7期613-618,共6页 中国物理B(英文版)
基金 the National Natural Science Foundation of China(Grant No.61804168)。
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