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Design and investigation of novel ultra-high-voltage junction field-effect transistor embedded with NPN

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摘要 Ultra-high-voltage(UHV)junction field-effect transistors(JFETs)embedded separately with the lateral NPN(JFETLNPN),and the lateral and vertical NPN(JFET-LVNPN),are demonstrated experimentally for improving the electrostatic discharge(ESD)robustness.The ESD characteristics show that both JFET-LNPN and JFET-LVNPN can pass the 5.5-k V human body model(HBM)test.The JFETs embedded with different NPNs have 3.75 times stronger in ESD robustness than the conventional JFET.The failure analysis of the devices is performed with scanning electron microscopy,and the obtained delayer images illustrate that the JFETs embedded with NPN transistors have good voltage endurance capabilities.Finally,the internal physical mechanism of the JFETs embedded with different NPNs is investigated with emission microscopy and Sentaurus simulation,and the results confirm that the JFET-LVNPN has stronger ESD robustness than the JFET-LNPN,because the vertical NPN has a better electron collecting capacity.The JFET-LVNPN is helpful in providing a strong ESD protection and functions for a power device.
作者 冯希昆 顾晓峰 马琴玲 杨燕妮 梁海莲 Xi-Kun Feng;Xiao-Feng Gu;Qin-Ling Ma;Yan-Ni Yang;Hai-Lian Liang(Engineering Research Center of Internet of Things Technology Applications(Ministry of Education),Department of Electronic Engineering,Jiangnan University,Wuxi 214122,China)
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第7期619-623,共5页 中国物理B(英文版)
基金 the National Natural Science Foundation of China(Grant No.61504049)。
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