摘要
Er_(x)Y_(2−x)SiO_(5) and Er_(x)Yb_(y)Y_(2−x−y)SiO_(5) crystalline thin films were investigated to apply to the high-gain media for silicon photonics.In addition to the sol–gel method,the directed self-assembly approach,using layer-by-layer deposition techniques,was also introduced to improve the crystallinity.The relaxation processes in Er ions were discussed to clarify the contribution of the energy transfer and cooperative upconversion.After optimization of the Er content,a Si photonic crystal slot Er_(x)Y_(2−x)SiO_(5) waveguide amplifier was fabricated,and a 30 dB∕cm modal gain was demonstrated.This achievement demonstrates the potential for compact and high optical gain devices on Si chips.
基金
This work was supported in part by JSPS KAKENHI Grant Number 22560003 and the Core-to-Core Program.