Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process

In the present state of the art,ion beam sputtering is used to produce low-loss dielectric optics.During the manufacturing of a dielectric layer stack,the deposition material must be changed,which requires rapid mechanical movement of vacuum components.These mechanical components can be regarded as a risk factor for contamination during the coating process,which limits the quality of high-end laser components.To minimize the particle contamination,we present a novel deposition concept that does not require movable components to change the coating material during the coating process.A magnetic field guiding technique has been developed,which enables the tuning of the refractive index in the layer structure by sputtering mixtures with varying compositions of two materials using a single-ion source.The versatility of this new concept is demonstrated for a highreflection mirror.