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Preparation of AlGaN/GaN Heterostructures on Sapphire Using Light Radiation Heating Metal-Organic Chemical Vapor Deposition at Low Pressure

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摘要 AlGaN/GaN heterostructures on sapphire substrate were fabricated by using light radiation heating metalor ganic chemical vapor deposition.Photoluminescence excitation spectra show that there are two abrupt slopes corresponding to the absorption edges of AlGaN and GaN,respectively.X-ray diffraction spectra clearly exhibit the GaN(0002),(0004),and A1GaN(0002),(0004)diffraction peaks,and no diffraction peak other than those from the GaN{0001}and A1GaN{0001}planes is found.Reciprocal space mapping indicates that there is no tilt between the AlGaN layer and the GaN layer.All results also indicate that the sample is of sound quality and the Al composition in the AlGaN layer is of high uniformity.
作者 ZHOU Yu-Gang SHEN Bo ZHANG Rong LI Wei-Ping CHEN Peng CHEN Zhi-zhong GU Shu-Lin SHI Yi Z.C.Huang ZHENG You-dou 周玉刚;沈波;张荣;李卫平;陈鹏;陈志忠;顾书林;施毅;Z.C.Huang;郑有炓(Solid State Microstructures Laboratory and Department of Physics,Nanjing University,Nanjing 210093;Raytheon ITSS,4500 Forbes Bulivard,MD 20771,USA)
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2000年第8期617-618,共2页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China under Grant Nos.69806006,69636010 and 69987001 the National High Technology Research&Development Project of China(863-715-011-0030).
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