摘要
AlGaN/GaN heterostructures on sapphire substrate were fabricated by using light radiation heating metalor ganic chemical vapor deposition.Photoluminescence excitation spectra show that there are two abrupt slopes corresponding to the absorption edges of AlGaN and GaN,respectively.X-ray diffraction spectra clearly exhibit the GaN(0002),(0004),and A1GaN(0002),(0004)diffraction peaks,and no diffraction peak other than those from the GaN{0001}and A1GaN{0001}planes is found.Reciprocal space mapping indicates that there is no tilt between the AlGaN layer and the GaN layer.All results also indicate that the sample is of sound quality and the Al composition in the AlGaN layer is of high uniformity.
基金
Supported by the National Natural Science Foundation of China under Grant Nos.69806006,69636010 and 69987001
the National High Technology Research&Development Project of China(863-715-011-0030).