摘要
Low temperature epitaxial growth of ZnO films is achieved on Si(001)substrates by reactive electron beam evap oration.Growth temperature is varied from 125 C to 420 C and the optimum temperature is found between 200°C and 300 C.X-ray diffraction shows that the ZnO films are highly c-axis oriented and the line width of(002)diffraction peak is significantly smaller than that measured from the ZnO films deposited by magnetron sput tering.The combined photoluminescence and photoluminescence excitation(PLE)spectroscopic measurements demonstrate the sharp band-absorption edge and exciton absorption in the ZnO films.PLE has also revealed that the absorption characteristic near the band edge is remarkably improved with the increase of oxygen content in the ZnO films,although x-ray diffraction analysis shows that the crystalline structure of ZnO films grown under different oxygen pressures remains unchanged.
作者
吴惠桢
徐晓玲
邱东江
何克明
寿翔
WU Hui-Zhen;XU Xiao-ling;QIU Dong-Jiang;HE Ke-Ming;SHOU Xiang(Department of Physics,Zhejiang University,Hangzhou 310028;State Key Laboratory of Silicon Materials Science,Zhejiang University,Hangzhou 310028)
基金
Supported by the National Natural Science Foundation of China under Grant No.69606006
Natural Science Fund of Zhejiang Province.