摘要
By using x-ray diffraction analysis,we investigate the major structural parameters such as strain state and crystal quality of non-polar a-plane In_(x)𝑦Ga_(1−x)𝑦N thin films grown on r-sapphire substrates by metalorganic chemical vapour deposition.The results of the inplane grazing incidence diffraction technique are analyzed and compared with a complementary out-of-plane high resolution x-ray diffraction technique.When the indium composition is low,the a-plane In_(x)𝑦Ga_(1−x)𝑦N layer is tensile strain in the growth direction(𝑏a-axis)and compressive strain in the two in-plane directions(𝑛a-axis and𝑑a-axis).The strain status becomes contrary when the indium composition is high.The stress in the𝑛a-axis direction𝜏σyy is larger than that in the a-axis directionσzz.Furthermore,strain in the two in-plane directions decrease and the crystal quality becomes better with the growing of the In_(x)Ga_(1−z)N film.
作者
赵桂娟
杨少延
刘贵鹏
刘长波
桑玲
谷承艳
刘祥林
魏鸿源
朱勤生
王占国
ZHAO Gui-Juan;YANG Shao-Yan;LIU Gui-Peng;LIU Chang-Bo;SANG Ling;GU Cheng-Yan;LIU Xiang-Lin;WEI Hong-Yuan;ZHU Qin-Sheng;WANG Zhan-Guo(Key Laboratory of Semiconductor Materials Science,Institute of Semiconductors,Chinese Academy of Sciences,P.O.Box 912,Beijing 100083;Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices,Institute of Semiconductors,Chinese Academy of Sciences,P.O.Box 912,Beijing 100083)
基金
Supported by the National Natural Science Foundation of China under Grant Nos 91233111,61274041,11275228,61006004 and 61076001
the National Basic Research Program of China(No 2012CB619305)
the National High-Technology R&D Program of China(No 2011AA03A101).