摘要
Erbium silicide nanoislands on Si(001)surface are fabricated by novel multiple depositions and annealing treatments method.The morphological investigations determine that the islands could grow with stable square shapes rather than the shape transformation exhibited in the traditional single time evaporation growth.Size distributions analyses further elucidate the effect of multiple depositions and annealing treatments on the nanoisland growth.It is suggested that strain relaxation and static coMescence play important roles in the cyclic growth.Specifically,after 15 times of the cycles,the larger islands are found to undergo the Ostwald ripening,which make the shape of nanoislands irregular.This gives us the direction to adjust the growth parameters to control the island morphology.Furthermore,the crystalline structure of the Er silicide nanoislands is efficiently characterized by grazing incidence synchrotron x-ray diffraction.
作者
丁涛
宋君强
蔡群
DING Tao;SONG Jun-Qiang;CAI Qun(Institute of Precision Optical Engineering,Department of Physics,Tongji University,Shanghai 200092;State Key Laboratory of Surface Physics and Department of Physics,Fudan University,Shanghai 200433;CAS Key Laboratory of Materials for Energy Conversion,Shanghai Institute of Ceramics,Chinese Academy of Sciences,Shanghai 200050)
基金
Supported by the National Basic Research Program of China under Grant No 2006CB921300
the Natural Science Foundation of Shanghai Science and Technology Committee under Grant No 08ZR1401700
Shanghai Postdoctoral Sustentation Fund under Grant No 10R21416600.
