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THE STRUCTURE AND ELECTRONIC STATES OF NiSi_(2)/Si(111) INTERFACES

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摘要 A theoretical investigation of HSiz/Si(lll)interfaces using empirical tight binding method and Slab Model is presented.The positions of Fermi level Ef for various types of interfaces has been compared.The heights of E_(f)for type-Ⅰ(a)and type-Ⅱ'(a)or for type-Ⅰ(b)and type-Ⅱ(b)are the sameJ but there exists a difference of O.leV between type-Ⅰ(a)and-Ⅰ(b)as well as for type-Ⅱ(a)and-Ⅱ(b).The local densities of states of some typical layers in the slab have also been studied.
作者 XU Yongnian ZHANG Kaiming XIE Xide 徐永年;张开明;谢希德(Institute of Modern Physics,Fudan University,Shanghai)
出处 《Chinese Physics Letters》 SCIE CAS 1986年第2期89-92,共4页 中国物理快报(英文版)
基金 supported by the Science Fund of the Chinese Academy of Sciences.
关键词 SI(111) FERMI POSITIONS
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