期刊文献+

THE STUDY ON DEFECTS IN SINGLE CRYSTAL SILICON WAFERS TREATED WITH DOUBLE-GETTERING TECHNIQUE

下载PDF
导出
摘要 Investigations on the nature and states of the defeats in single crystal wafers treated with double-gettering technique have been carried out by means of optical microscopy,electron microscopy,electron miaroanalysis and spread resistance.Phosphorus profile in these wafers was measured.And the effect of phosphorus on defects and resistivity was determined.
作者 麦振洪 戴道扬 周志仁 叶以正 叶水驰 MAI Zhenhong;DAI Daoyang;ZHOU Shiren;YE Yizheng;YE Shuichi(Institute of Physics,Academia Sinica,Beijing;Harbin Institute of Technology,Harbin)
出处 《Chinese Physics Letters》 SCIE CAS 1986年第3期113-116,共4页 中国物理快报(英文版)
  • 相关文献

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部