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WORK FUNCTION AND ELECTRONIC STRUCTURE OF Co OVERLAYERS ON THE ION SPUTTERED BASAL FACE OF MoS_(2) SINGLE CRYSTAL

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摘要 Work function and photoemission spectroscopy have been applied to the study of the interaction of Co overlayers with the ion sputtered basal face of MoS_(2)(0001).The experimental results show that upon Co deposition the work function of the MoS_(2)substrate drops rapidly and reaches a minimum value of-0.65eV forΔФ,and then increases to the metal Co work function at coverages greater than a monolayer.The Fermi level pinning at 2.2eV above the Mo 4dz2 peak has been found at a low submonolayer coverage.
作者 胡永军 林彰达 谢侃 伍乃娟 HU Yongjun;LIN Zhangda;XIE Kan;WU Naijuan(Institute of Physics,Academia Sinica,Beijing)
机构地区 Institute of Physics
出处 《Chinese Physics Letters》 SCIE CAS 1988年第4期169-172,共4页 中国物理快报(英文版)
基金 Project supported by NSFC.
关键词 function MOS COVERAGE
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