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Field Effect Transistor with Self-Organized In_(0.15)Ga_(0.85)As/GaAs Quantum Wires as a Channel Grown on (553)B GaAs Substrates

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摘要 A functional field effect transistor with self-organized In_(0.15)Ga_(0.85)As/GaAs quantum wires(QWRs)as a channel was achieved by molecular beam epitaxy on a(553)B GaAs substrate.Both the three-dimensional image of atom force microscopy and the polarization of the photoluminance peaks reveal that the channel of the device is a self-organized QWR structure.The device with a gate-length of 2μm and a source-drain spacing of 5μm performed a good enhancement-mode characteristic and a maximum transconductance of 65 mS/mm was obtained at the gate voltage of 1.0 V by the geometric gate-width at room temperature.The saturated drain current is as high as 5.6 mA.The device exhibited a much larger current capacity due to the high density of the self-organized QWRs in its channel layer.In addition,the effective gate width was discussed in comparison with the geometric gate width of the device,from which a larger maximum transconductance of 130 mS/mm could be estimated.
作者 LI Xian-Jie YAN Fa-Wang ZHANG Wen-Jun ZHANG Rong-Gui LIU Wei-Ji AO Jin-Ping ZENG Qing-Ming LIU Shi-Yong LIANG Chun-Guang 李献杰;闫发旺;张文俊;张荣桂;刘伟吉;敖金平;曾庆明;刘式墉;梁春广(Hebei Semiconductor Research Institute,Shijiazhuang 050051;Department of Electronic Engineering,Jilin University,Changchun 130023;Department of Electrical and Electronic Engineering,Tokushima University,Tokushima 770-8506,Japan)
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2001年第8期1147-1149,共3页 中国物理快报(英文版)
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